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工业显微镜广泛应用于半导体,电子工业进行晶体,集成电路的检验和科学研究.配备有反射照明,成象和观察系统,偏光装置.
Industrial microscope is widely used for crystal, integrated circuit (IC) examination and research. It is supplied with reflected illumination, imaging and viewing system, polarized imaging system.
规格 Specifications
◇ 无限远光学系统,管镜焦距200mm,
Infinitive Optical System, Tube Lens Focal Length 200mm
◇ 铰链式三目镜筒,30°倾斜, 瞳距55-75mm,
Compensation Free Trinocular Tube, Inclined at 30°, Interpupillary Distance 55-75mm,.
◇ 高眼点,大视场目镜WF10X/22
High Point and Wide Field Eyepiece WF10/22
◇ 长工作距离,平场复消色差物镜2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42
Long Working Distance, Plan Apo Objectives 2X/0.055, 5X/0.14, 10X/0.28, 20X/0.29, 50X/0.42
◇ 五孔物镜转换器,物镜螺纹M26x0.706
Quintuple Nosepiece, Objective Screw M26x0.706
◇ 6″双层活动平台,移动范围6
